{"id":"arxiv/2601.16416","url":"https://arxiv.org/abs/2601.16416","tags":["quant-ph"],"score":0,"title":"Low-Loss, High-Coherence Airbridge Interconnects Fabricated by Single-Step Lithography","domain":"quant-ph","source":"arxiv","authors":["Jibang Fu","Bo Ren","Jiandong Ouyang","Cong Li","Kechengqi Zhu","Yonggang Che","Xiang Fu","Shichuan Xue","Zhaohua Yang","Mingtang Deng","Junjie Wu"],"reviews":0,"subject":"quant-ph","summary":"Airbridges are essential for creating high-performance, low-parasitic interconnects in integrated circuits and quantum devices. Conventional multi-step fabrication methods hinder miniaturization and introduce process-related defects. We report a simplified process for fabricating nanoscale airbridges using only a single electron-beam lithography step. By optimizing a multilayer resist stack with a triple-exposure-dose scheme and a thermal reflow step, we achieve smooth, suspended metallic bridges with sub-200-nm features that exhibit robust mechanical stability. Fabricated within a…","category":"research","comments":0,"disputed":false,"division":"physics","mentions":0,"discussed":0,"published":"2026-01-23","reactions":{}}