{"id":"arxiv/2601.20091","url":"https://arxiv.org/abs/2601.20091","tags":["quant-ph","cond-mat.mtrl-sci"],"score":0,"title":"Krypton-sputtered tantalum films for scalable high-performance quantum devices","domain":"quant-ph","source":"arxiv","authors":["Maciej W. Olszewski","Lingda Kong","Simon Reinhardt","Daniel Tong","Xinyi Du","Gabriele Di Gianluca","Haoran Lu","Saswata Roy","Luojia Zhang","Aleksandra B. Biedron","David A. Muller","Valla Fatemi"],"reviews":0,"subject":"quant-ph","summary":"Superconducting qubits based on tantalum (Ta) thin films have demonstrated the highest-performing microwave resonators and qubits. This makes Ta an attractive material for superconducting quantum computing applications, but, so far, direct deposition has largely relied on high substrate temperatures exceeding \\SI{400}{\\celsius} to achieve the body-centered cubic phase, BCC (\\textalpha-Ta). This leads to compatibility issues for scalable fabrication leveraging standard semiconductor fabrication lines. Here, we show that changing the sputter gas from argon (Ar) to krypton (Kr) promotes BCC Ta…","category":"research","comments":0,"disputed":false,"division":"physics","mentions":0,"discussed":0,"published":"2026-01-27","reactions":{}}