{"id":"arxiv/2602.20234","url":"https://arxiv.org/abs/2602.20234","tags":["quant-ph"],"score":0,"title":"Quantum Simulations for Extreme Ultraviolet Photolithography","domain":"quant-ph","source":"arxiv","authors":["Tyler D. Kharazi","Stepan Fomichev","Shu Kanno","Takao Kobayashi","Juan Miguel Arrazola","Qi Gao","Torin F. Stetina"],"reviews":0,"subject":"quant-ph","summary":"A key challenge of extreme ultraviolet (EUV) lithography in semiconductor fabrication is the line edge roughness or \"blur\" produced by the electron cascades following absorption of a high-energy photon. Here we present quantum algorithms to compute EUV absorption and photoelectron emission spectra, which are key to predicting blur. The first is a time-domain algorithm resolving absorption at a given frequency; the second is a first-quantized plane-wave algorithm computing the photoemission spectrum via real-time dynamics that treats bound and continuum states on equal footing. For a model…","category":"research","comments":0,"disputed":false,"division":"physics","mentions":0,"discussed":0,"published":"2026-02-23","reactions":{}}