{"id":"arxiv/2605.19590","url":"https://arxiv.org/abs/2605.19590","tags":["quant-ph","physics.app-ph"],"score":0,"title":"Photolithography-Only Fabrication of Transmons Using Double-Oblique Evaporation","domain":"quant-ph","source":"arxiv","authors":["K. Aoyanagi","S. Abe","S. Chen","T. Inada","C. Kawai","Y. Mino","K. Nakamura","K. Nakazono","T. Nitta","K. Watanabe"],"reviews":0,"subject":"quant-ph","summary":"We investigate a photolithography-only fabrication process for transmon Josephson junctions using a modified double-oblique evaporation geometry. Using a bilayer resist process and Al shadow evaporation, we fabricate junction structures and confirm by optical and scanning electron microscopy that the resulting narrowed crossing region reaches a geometrical area on the order of $10^4~\\mathrm{nm}^2$, which lies in the size range relevant to qubit junction fabrication. Room-temperature resistance screening shows that the junction resistance falls within the target range for the present transmon…","category":"research","comments":0,"disputed":false,"division":"physics","mentions":0,"discussed":0,"published":"2026-05-19","reactions":{}}