Resist-free shadow deposition using silicon trenches for Josephson junctions in superconducting qubits

Tathagata Banerjee, Stephen Daniel Funni, Saswata Roy, Judy J. Cha, Valla Fatemi

arXivarxiv/2604.09796Apr 10, 2026quant-phscore 0

Superconducting qubit fabrication innovations continue to be explored to achieve higher performance. Despite improvements to base layer fabrication and processing, resist-based Josephson junction (JJ) schemes have largely remained unchanged. The polymer mask during deposition causes chemical contamination and limits in situ and ex situ surface preparation, junction materials, and scalability. Here, we demonstrate a resist-free approach to junction fabrication based on etched silicon trenches that is CMOS compatible and easily integrated into existing innovations in qubit base layer…

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