A simple method to fabricate Josephson junctions
A minimal method to fabricate Al/AlO$_x$/Al Josephson junctions (JJs) using photolithography and argon etching, before metallization and oxidation, is demonstrated. JJs with areas ranging from 1 to 6 $μ$m$^2$ can be fabricated and, with the appropriate oxidation conditions, the junction resistance can be varied by $\sim$2 orders of magnitude. Transmission electron microscopy reveals the successful fabrication of JJs with few grain boundaries suggesting reduced energy loss from two-level-systems. Superconducting QUantum Interference Devices (SQUIDs) fabricated from this methodology exhibit…
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