Krypton-sputtered tantalum films for scalable high-performance quantum devices

Maciej W. Olszewski, Lingda Kong, Simon Reinhardt, Daniel Tong, Xinyi Du, Gabriele Di Gianluca, Haoran Lu, Saswata Roy, Luojia Zhang, Aleksandra B. Biedron, David A. Muller, Valla Fatemi

arXivarxiv/2601.20091Jan 27, 2026quant-phscore 0

Superconducting qubits based on tantalum (Ta) thin films have demonstrated the highest-performing microwave resonators and qubits. This makes Ta an attractive material for superconducting quantum computing applications, but, so far, direct deposition has largely relied on high substrate temperatures exceeding \SI{400}{\celsius} to achieve the body-centered cubic phase, BCC (\textalpha-Ta). This leads to compatibility issues for scalable fabrication leveraging standard semiconductor fabrication lines. Here, we show that changing the sputter gas from argon (Ar) to krypton (Kr) promotes BCC Ta…

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