Quantum Simulations for Extreme Ultraviolet Photolithography

Tyler D. Kharazi, Stepan Fomichev, Shu Kanno, Takao Kobayashi, Juan Miguel Arrazola, Qi Gao, Torin F. Stetina

arXivarxiv/2602.20234Feb 23, 2026quant-phscore 0

A key challenge of extreme ultraviolet (EUV) lithography in semiconductor fabrication is the line edge roughness or "blur" produced by the electron cascades following absorption of a high-energy photon. Here we present quantum algorithms to compute EUV absorption and photoelectron emission spectra, which are key to predicting blur. The first is a time-domain algorithm resolving absorption at a given frequency; the second is a first-quantized plane-wave algorithm computing the photoemission spectrum via real-time dynamics that treats bound and continuum states on equal footing. For a model…

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