A scalable platform for nanometer-scale quantum confinement

Christina M. Spaegele, Mehdi Rezaee, Thomas Werkmeister, Soon Wei Daniel Lim, Kailyn Vaillancourt, Joon-Suh Park, Paul Chevalier, Ido Kaminer, Philip Kim, Federico Capasso, Michele Tamagnone

arXivarxiv/2604.08957Apr 10, 2026physics.opticsscore 0

Overcoming the limitations of current nanofabrication techniques to achieve nanoscale feature sizes is essential for achieving new regimes of light-matter interactions at extreme frequencies and length scales. Here, we demonstrate a scalable nanofabrication platform capable of producing in-plane feature sizes down to 1.75 nm, pushing the boundaries of current top-down nanofabrication techniques. Using precise thickness control of atomic layer deposition (ALD) and employing widely spaced oxide nanofins, we transform conventional ALD into a surface structuring method that produces…

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