Photolithography-Only Fabrication of Transmons Using Double-Oblique Evaporation

K. Aoyanagi, S. Abe, S. Chen, T. Inada, C. Kawai, Y. Mino, K. Nakamura, K. Nakazono, T. Nitta, K. Watanabe

arXivarxiv/2605.19590May 19, 2026quant-phscore 0

We investigate a photolithography-only fabrication process for transmon Josephson junctions using a modified double-oblique evaporation geometry. Using a bilayer resist process and Al shadow evaporation, we fabricate junction structures and confirm by optical and scanning electron microscopy that the resulting narrowed crossing region reaches a geometrical area on the order of $10^4~\mathrm{nm}^2$, which lies in the size range relevant to qubit junction fabrication. Room-temperature resistance screening shows that the junction resistance falls within the target range for the present transmon…

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