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Strong intervalley mixing between copropagating quantum Hall edge channels in a silicon MOSFET

Gento Yamahata, Takase Shimizu

arXivarxiv/2607.15675Jul 17, 2026cond-mat.mes-hallscore 0

Copropagating quantum Hall edge channels provide a promising platform for compact electron interferometry and flying quantum states. In silicon, the valley degree of freedom offers a natural alternative to spin-resolved edge channels because spin-flip scattering is strongly suppressed by the weak spin-orbit interaction. Here, we investigate interchannel transitions between copropagating valley edge channels in a double-layer-gated silicon metal-oxide-semiconductor field-effect transistor. With the bulk filling factor set to $ν=2$, two spin-polarized valley edge channels are brought into…

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